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Vacuum deposition
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<p>Vacuum deposition is a group of processes used to deposit layers of material atom-by-atom or molecule-by-molecule on a solid surface. These processes operate at pressures well below <a href="/facts/Atmospheric_pressure/wJLMSaVG">atmospheric pressure</a> (i.e., <a href="/facts/Vacuum/BTk3goyV">vacuum</a>). The deposited layers can range from a thickness of one atom up to millimeters, forming freestanding structures. Multiple layers of different materials can be used, for example to form <a href="/facts/Optical_coating/pGnrNRn6">optical coatings</a>. The process can be qualified based on the vapor source; <a href="/facts/Physical_vapor_deposition/RNcNPVjU">physical vapor deposition</a> uses a liquid or solid source and <a href="/facts/Chemical_vapor_deposition/7khLxeU5">chemical vapor deposition</a> uses a chemical vapor. </p>