Laser chemical vapor deposition

<p>Laser chemical vapor deposition (LCVD) is a chemical process used to produce high purity, high performance films, fibers, and mechanical hardware (MEMS). It is a form of <a href="/facts/Chemical_vapor_deposition/7khLxeU5">chemical vapor deposition</a> in which a <a href="/facts/Laser/jk6PTvvT">laser beam</a> is used to locally heat the semiconductor <a href="/facts/Wafer_(electronics)/lCBJAoUL">substrate</a>, causing the vapor deposition chemical reaction to proceed faster at that site. The process is used in the semiconductor industry for spot coating, the MEMS industry for <a href="/facts/3D_printing/lbvWU3t0">3-D printing</a> of hardware such as <a href="/facts/Spring_(device)/jknGXzTq">springs</a> and heating elements,2,6,7,9 and the composites industry for <a href="/facts/Boron/Pmwgd7Mf">boron</a> and ceramic fibers.  As with conventional CVD, one or more <a href="/facts/Gas/hVVAoodV">gas</a> phase precursors are thermally decomposed, and the resulting chemical species 1) deposit on a surface, or 2) react, form the desired <a href="/facts/Compound_(chemistry)/37FXqqtv">compound</a>, and then deposit on a surface, or a combination of (1) and (2).
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Laser chemical vapor deposition open-in-new

Laser chemical vapor deposition